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41st Mask and Lithography Conference - EMLC 2026
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41st Mask and Lithography Conference - EMLC 2026
41st Mask and Lithography Conference - EMLC 2026
the European Mask Lithography Conference - Zeiss Student Awards, turn your research into recognition!
Prototype of a quantum light source.
Image: Jürgen Scheere (University of Jena)
Overview
Event details
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Start
22 June 2026, 7:00
End
24 June 2026, 22:00
Types of event
Conference
Venue
Abbe Center of Photonics
Albert-Einstein-Str 6, Auditorium
07745 Jena
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External link
Language of the event
English
Event website
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External link
de
Wheelchair access
Yes
Public
Yes