Prototype of a quantum light source.

41st Mask and Lithography Conference - EMLC 2026

the European Mask Lithography Conference - Zeiss Student Awards, turn your research into recognition!
Prototype of a quantum light source.
Image: Jürgen Scheere (University of Jena)
Event details
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Start
End
Types of event
Conference
Venue
Abbe Center of Photonics
Albert-Einstein-Str 6, Auditorium
07745 Jena
Google Maps site planExternal link
Language of the event
English
Event website
Learn moreExternal linkde
Wheelchair access
Yes
Public
Yes